Prof. Se-Young Jeong’s research team developed a splendid achievement
Published on the 17th in the international scientific journal Nature
A Korean research team made a thin and smooth copper film at the level of an atom, and through this, the worlds first understanding of the principle of copper oxidation through theory and experimentation, taking one step closer to applying rust-resistant copper to the industry. Copper is widely used in electric wires and electronic circuits due to its high electrical conductivity, but it is difficult to use for ultra-precision materials because it oxidizes easily. For this reason, gold, which has low electrical conductivity and is expensive, has been mainly used instead of copper.
However, a research team led by Professor Se-young Jeong of Pusan National University, Professor Young-min Kim of Sungkyunkwan University, and Professor Seong-gon Kim of Mississippi State University found that oxidation does not occur when copper is made into a thin and smooth ultra-planar single-crystal copper thin film at the level of one atomic layer.
The research team succeeded in realizing an ultra-flat copper thin film at the level of a monoatomic layer through a method developed by the research team.
The research team has modified the existing thin film growth device with its own technology to create an inexpensive device that can grow ultra-flat thin films on a large area.
The ultra-flat copper thin film produced by this device was exposed to air for one year and observed using a high-resolution transmission electron microscope, etc. didnt